Invention Grant
- Patent Title: High frequency generator and plasma processing apparatus
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Application No.: US15914951Application Date: 2018-03-07
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Publication No.: US10818478B2Publication Date: 2020-10-27
- Inventor: Mitsutoshi Ashida
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Fenwick & West LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@36521d60
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
In a high frequency generator, a high frequency generated by an IQ modulation of a vector multiplier and a amplification of an amplifier is outputted through an output unit. An directional coupler outputs a first high frequency including a part of traveling waves and a second high frequency including a part of reflected waves. A control units obtains an estimated value of each of an in-phase component and an orthogonal component of the traveling waves in the output unit, and an in-phase component and an orthogonal component of the reflected waves in the output unit by performing a first matrix operation that is an operation of four polynomials, each including as multi-variables an in-phase component and an orthogonal component of a first high frequency and an in-phase component and an orthogonal component of the second high frequency.
Public/Granted literature
- US20180261432A1 HIGH FREQUENCY GENERATOR AND PLASMA PROCESSING APPARATUS Public/Granted day:2018-09-13
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