Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US16460476Application Date: 2019-07-02
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Publication No.: US10818679B2Publication Date: 2020-10-27
- Inventor: Digh Hisamoto , Yoshiyuki Kawashima
- Applicant: RENESAS ELECTRONICS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@9c52b7e
- Main IPC: H01L27/11521
- IPC: H01L27/11521 ; H01L21/8234 ; H01L27/1158 ; H01L27/11565 ; H01L27/11568

Abstract:
In a MONOS memory of the split-gate type formed by a field effect transistor formed on a fin, it is prevented that the rewrite lifetime of the MONOS memory is reduced due to charges being locally transferred into and out of an ONO film in the vicinity of the top of the fin by repeating the write operation and the erase operation. By forming a source region at a position spaced downward from a first upper surface of the fin in a region directly below a memory gate electrode, the current is prevented from flowing concentratedly at the upper end of the fin.
Public/Granted literature
- US20200035693A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2020-01-30
Information query
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