A control system is disclosed for a material application system. A sensor may be disposed and configured to monitor one or more of a material level and a material flow for the material application system. A signal may be received from the sensor corresponding to the material level or flow. A reference quantity of material contained by the material application system, an expected application rate for the material, and an indicator of current application duration may be determined. An estimated application rate may be determined based upon one or more of the indicator of current application duration, the reference quantity of material, and the signal. The estimated and expected application rates may be compared and the expected application rate updated based upon the comparison. A remaining interval for application without a replenishment of the container may be determined and indicated to an operator.