Invention Grant
- Patent Title: Water measurement apparatus
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Application No.: US16583434Application Date: 2019-09-26
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Publication No.: US10823682B2Publication Date: 2020-11-03
- Inventor: Takamasa Sugiura , Fumitaka Moroishi , Masato Kajinami
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, PC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6ffb6f70
- Main IPC: H01L21/78
- IPC: H01L21/78 ; G01N21/95 ; H01L21/67 ; G01N21/64 ; G01N21/88 ; H04N5/235 ; H04N5/225 ; G06T7/00 ; H01L21/687

Abstract:
A wafer measurement apparatus for measuring a bonding strength of a bonded wafer includes a wafer holder to hold a bonded wafer into which a blade is inserted and where a crack occurs, a lighting assembly including a light source, a light source controller to select the light source of the lighting assembly for detection of the crack reflected in the bonded wafer, on photographing conditions, a photographing assembly to photograph the bonded wafer by using the photographing conditions corresponding to a wavelength of the light source, on sensitivity of the wavelength of the light source, and a calculator to select one photographing condition, transmit the selected photographing condition, and calculate bonding strength, on a crack distance from a blade edge, extracted from an image of the bonded wafer, to a crack edge.
Public/Granted literature
- US20200217805A1 WATER MEASUREMENT APPARATUS Public/Granted day:2020-07-09
Information query
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