A plasma light source with lamp house correction is disclosed. The system may include a pump source configured to generate pump illumination. The pump illumination may be directed, by an elliptical reflector element, to a volume of gas contained within a plasma lamp in order to generate a plasma. The plasma may be configured to generate broadband illumination. The system may also include a correction plate and/or an aspherical elliptical reflector element configured to alter the pump illumination to correct for aberrations introduced by the plasma lamp. The system may also include an additional aspherical correction plate configured to alter the broadband illumination to correct for aberrations introduced by optical elements of the system.