Invention Grant
- Patent Title: Separate plasma source coil and method of controlling the same
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Application No.: US16712061Application Date: 2019-12-12
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Publication No.: US10825655B1Publication Date: 2020-11-03
- Inventor: Sang Woo Lee
- Applicant: Adaptive Plasma Technology Corp.
- Applicant Address: KR Icheon-Si
- Assignee: ADAPTIVE PLASMA TECHNOLOGY CORP.
- Current Assignee: ADAPTIVE PLASMA TECHNOLOGY CORP.
- Current Assignee Address: KR Icheon-Si
- Agency: Cantor Colburn LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@78504869
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/306 ; H01L21/67
Abstract:
Provided is a separate plasma source coil and a method of controlling the same. The separate plasma source coil includes a center coil group disposed around a coil center and including one or more linear center coils, and an edge coil group disposed around the center coil group and including one or more linear edge coils.
Information query
