Invention Grant
- Patent Title: Semiconductor device including capacitor and method of forming the same
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Application No.: US16012997Application Date: 2018-06-20
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Publication No.: US10825889B2Publication Date: 2020-11-03
- Inventor: Sang Yeol Kang , Kyu Ho Cho , Han Jin Lim , Cheol Seong Hwang
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@79f24e25
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01L27/108

Abstract:
A semiconductor device including a switching element on a substrate, a pad isolation layer on the switching element, a conductive pad passing through the pad isolation layer and connected to the switching element, an insulating pattern on the pad isolation layer and having a height greater than a horizontal width, a lower electrode on side surfaces of the insulating pattern on side surfaces of the insulating pattern and in contact with the conductive pad, a capacitor dielectric layer on the lower electrode and having a monocrystalline dielectric layer and a polycrystalline dielectric layer, the monocrystalline dielectric layer being relatively close to side surfaces of the insulating pattern compared to the polycrystalline dielectric layer an upper electrode on the capacitor dielectric layer may be provided.
Public/Granted literature
- US20190214455A1 SEMICONDUCTOR DEVICE INCLUDING CAPACITOR AND METHOD OF FORMING THE SAME Public/Granted day:2019-07-11
Information query
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