Invention Grant
- Patent Title: Magnetoresistance effect element
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Application No.: US16451791Application Date: 2019-06-25
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Publication No.: US10825985B2Publication Date: 2020-11-03
- Inventor: Shinto Ichikawa , Katsuyuki Nakada , Tomoyuki Sasaki
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@23ce6bdc
- Main IPC: H01L43/10
- IPC: H01L43/10 ; G01R33/09 ; H01L43/08 ; G11B5/39 ; H01L27/22 ; H01F10/32 ; B82Y25/00

Abstract:
A magnetoresistance effect element includes a first ferromagnetic layer, a second ferromagnetic layer, and a tunnel barrier layer that is interposed between the first ferromagnetic layer and the second ferromagnetic layer. The tunnel barrier layer is a stacked body including one or more first oxide layers having a spinel structure and one or more second oxide layers having a spinel structure with a composition which is different from a composition of the first oxide layer.
Public/Granted literature
- US20200006642A1 MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2020-01-02
Information query
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