Invention Grant
- Patent Title: Heterostructure and method of fabrication
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Application No.: US15735477Application Date: 2016-06-09
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Publication No.: US10826459B2Publication Date: 2020-11-03
- Inventor: Arnaud Castex , Daniel Delprat , Bernard Aspar , Ionut Radu
- Applicant: Soitec
- Applicant Address: FR Bemin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bemin
- Agency: TraskBritt
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3fd11662
- International Application: PCT/EP2016/063198 WO 20160609
- International Announcement: WO2016/198542 WO 20161215
- Main IPC: H03H9/02
- IPC: H03H9/02 ; H03H3/10 ; H01L41/312 ; H01L41/08 ; H01L41/313 ; H01L41/47 ; H03H3/04 ; H01L41/332 ; H01L41/337 ; H03H9/64

Abstract:
The present invention relates to a heterostructure, in particular, a piezoelectric structure, comprising a cover layer, in particular, a layer of piezoelectric material, the material of the cover layer having a first coefficient of thermal expansion, assembled to a support substrate, the support substrate having a second coefficient of thermal expansion substantially different from the first coefficient of thermal expansion, at an interface wherein the cover layer comprises at least a recess extending from the interface into the cover layer, and its method of fabrication.
Public/Granted literature
- US20180159498A1 HETEROSTRUCTURE AND METHOD OF FABRICATION Public/Granted day:2018-06-07
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