Invention Grant
- Patent Title: Reticle management method and semiconductor device fabrication method including the same
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Application No.: US16774543Application Date: 2020-01-28
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Publication No.: US10831115B1Publication Date: 2020-11-10
- Inventor: Yongseung Moon , Sungyong Cho
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@40b90032
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/673
Abstract:
Disclosed are reticle management methods and semiconductor device fabrication methods. The reticle management method includes inspecting a reticle using a first inspection method, inspecting a reticle pod storing the reticle using a second inspection method different from the first inspection method, and cleaning the reticle pod when a particle is present on the reticle pod.
Information query
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