Invention Grant
- Patent Title: Method for manufacturing difluoromethylene compound
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Application No.: US16471975Application Date: 2017-12-22
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Publication No.: US10851031B2Publication Date: 2020-12-01
- Inventor: Tatsuya Ohtsuka , Yoshichika Kuroki , Atsushi Shirai , Moe Hosokawa , Yosuke Kishikawa
- Applicant: DAIKIN INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2016-251315 20161226; JP2017-218128 20171113
- International Application: PCT/JP2017/046195 WO 20171222
- International Announcement: WO2018/123890 WO 20180705
- Main IPC: C07C17/18
- IPC: C07C17/18 ; C07C67/307

Abstract:
The problem to be solved by the present invention is to provide a novel method for producing a difluoromethylene compound. This problem is solved by a method for producing a difluoromethylene compound containing a —CF2— moiety, the method comprising step A of mixing: a) a carbonyl compound containing a —C(O)— moiety; b) optionally an amine; c) a fluoride represented by the formula: MF, wherein M represents a Group 1 element of the periodic table; d) a halogenated fluorine compound represented by the formula: XFn, wherein X represents chlorine, bromine, or iodine, and n is a natural number of 1 to 5; and e) sulfur chloride.
Public/Granted literature
- US20200087230A1 METHOD FOR MANUFACTURING DIFLUOROMETHYLENE COMPOUND Public/Granted day:2020-03-19
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