Invention Grant
- Patent Title: Apparatus for X-ray inspection, and a method for manufacturing a semiconductor device using the same
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Application No.: US16115884Application Date: 2018-08-29
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Publication No.: US10852259B2Publication Date: 2020-12-01
- Inventor: Kyoung Hwan Lee , Sang Min Kim , Young Hoon Sohn , Yu Sin Yang , Chi Hoon Lee
- Applicant: Samsung Electronics Co., Ltd.
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Agency: Myers Bigel, P.A.
- Priority: KR10-2017-0171860 20171214
- Main IPC: G01N23/223
- IPC: G01N23/223 ; H01L21/67 ; H01L21/66

Abstract:
An apparatus for X-ray inspection is provided. The apparatus includes: a stage on which an inspection target is loaded, the stage including a first surface and an opposite second surface; an X-ray generator disposed on or over the first surface of the inspection target and configured to irradiate the inspection target with incident X-rays; and a detection system disposed on or under the second surface of the inspection target and configured to detect first transmitted X-rays transmitted through the inspection target. The detection unit includes a first lens system and a second lens system. The first transmitted X-rays pass through one of the first lens system and the second lens system. The second lens system includes a micro zone plate.
Public/Granted literature
- US20190187077A1 APPARATUS FOR X-RAY INSPECTION, AND A METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME Public/Granted day:2019-06-20
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