Invention Grant
- Patent Title: Displacement based overlay or alignment
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Application No.: US16300314Application Date: 2017-04-20
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Publication No.: US10852646B2Publication Date: 2020-12-01
- Inventor: Marinus Jochemsen , Scott Anderson Middlebrooks , Stefan Hunsche , Te-Sheng Wang
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2017/059371 WO 20170420
- International Announcement: WO2017/194285 WO 20171116
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method including obtaining an image of a plurality of structures on a substrate, wherein each of the plurality of structures is formed onto the substrate by transferring a corresponding pattern of a design layout; obtaining, from the image, a displacement for each of the structures with respect to a reference point for that structure; and assigning each of the structures into one of a plurality of groups based on the displacement.
Public/Granted literature
- US20190146358A1 DISPLACEMENT BASED OVERLAY OR ALIGNMENT Public/Granted day:2019-05-16
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