Invention Grant
- Patent Title: Print substrate surface modification
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Application No.: US15569470Application Date: 2015-07-31
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Publication No.: US10852680B2Publication Date: 2020-12-01
- Inventor: Tamir Weinstein , Dror Kella , Dafna Or-Chen , Martin Chauvin , Shahar Stein
- Applicant: HP INDIGO B.V.
- Applicant Address: NL Amstelveen
- Assignee: HP Indigo B.V.
- Current Assignee: HP Indigo B.V.
- Current Assignee Address: NL Amstelveen
- Agency: Trop Pruner & Hu PC
- International Application: PCT/EP2015/067650 WO 20150731
- International Announcement: WO2017/020925 WO 20170209
- Main IPC: B41M5/00
- IPC: B41M5/00 ; G03G15/00

Abstract:
There is provided a method and apparatus for preparing a print substrate. A surface resistivity of a print substrate comprising a conductive layer is determined. The determined surface resistivity is compared to a print range having a lower threshold value for the surface resistivity of the print substrate and an upper threshold value for the surface resistivity of the print substrate. If the determined resistivity of the print substrate is outside the print range, a surface modification is selected to adjust the determined surface resistivity of the print substrate to fall within the print range. The selected surface modification is applied to the top layer of the print substrate.
Public/Granted literature
- US20180088506A1 PRINT SUBSTRATE SURFACE MODIFICATION Public/Granted day:2018-03-29
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