Invention Grant
- Patent Title: Feedforward temperature control for plasma processing apparatus
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Application No.: US15013795Application Date: 2016-02-02
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Publication No.: US10854425B2Publication Date: 2020-12-01
- Inventor: Chetan Mahadeswaraswamy , Walter R Merry , Sergio Fukuda Shoji , Chunlei Zhang , Yashaswini Pattar , Duy D Nguyen , Tina Tsong , Shane C Nevil , Douglas A Buchberger, Jr. , Fernando M Silveira , Brad L Mays , Kartik Ramaswamy , Hamid Noorbakhsh
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; G05B6/02 ; H05H1/00
Abstract:
Methods and systems for controlling temperatures in plasma processing chamber with reduced controller response times and increased stability. Temperature control is based at least in part on a feedforward control signal derived from a plasma power input into the processing chamber. A feedforward control signal compensating disturbances in the temperature attributable to the plasma power may be combined with a feedback control signal counteracting error between a measured and desired temperature.
Public/Granted literature
- US20160155612A1 FEEDFORWARD TEMPERATURE CONTROL FOR PLASMA PROCESSING APPARATUS Public/Granted day:2016-06-02
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