Invention Grant
- Patent Title: Substrate processing method and substrate processing apparatus
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Application No.: US15950557Application Date: 2018-04-11
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Publication No.: US10854469B2Publication Date: 2020-12-01
- Inventor: Taiki Hinode
- Applicant: SCREEN Holdings Co., Ltd.
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Agency: Ostrolenk Faber LLP
- Priority: JP2017-083934 20170420
- Main IPC: H01L21/311
- IPC: H01L21/311 ; H01L21/687 ; H01L21/67 ; G05D11/00 ; H01L21/66
Abstract:
When a silicon concentration of a phosphoric acid aqueous solution inside a tank reaches an upper limit value of a specified concentration range, the phosphoric acid aqueous solution is drawn off from the tank and/or an amount of the phosphoric acid aqueous solution returning to the tank is decreased to decrease a liquid amount inside the tank to a value not more than a lower limit value of a specified liquid amount range. When the liquid amount inside the tank decreases to the value not more than the lower limit value of the specified liquid amount range, the phosphoric acid aqueous solution is replenished to the tank to increase the liquid amount inside the tank to a value within the specified liquid amount range and decrease the silicon concentration of the phosphoric acid aqueous solution inside the tank to a value within the specified concentration range.
Public/Granted literature
- US20180308706A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS Public/Granted day:2018-10-25
Information query
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