Invention Grant
- Patent Title: Film processing unit, substrate processing apparatus and substrate processing method
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Application No.: US15772229Application Date: 2016-10-27
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Publication No.: US10854480B2Publication Date: 2020-12-01
- Inventor: Yuji Tanaka , Masaya Asai , Masahiko Harumoto , Koji Kaneyama
- Applicant: SCREEN HOLDINGS CO., LTD.
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Agency: Ostrolenk Faber LLP
- Priority: JP2015-220496 20151110
- International Application: PCT/JP2016/081851 WO 20161027
- International Announcement: WO2017/082065 WO 20170518
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G03F7/16 ; B05B1/28 ; B05C11/02 ; H01L21/677 ; H01L21/687 ; G03F7/09 ; G03F7/004 ; G03F7/30

Abstract:
A substrate is held and rotated by a spin chuck, and a coating liquid is discharged to the substrate. The coating liquid that is splashed outwardly from the substrate is received by an outer cup. A cleaning liquid that has been discharged from a cup cleaning nozzle is discharged to an inner peripheral surface of the outer cup through a first guide to clean the outer cup. Thus, the coating liquid, its solidified matter and the like adhering to the outer cup are dissolved and removed from the outer cup. Subsequently, a metal removal liquid that has been discharged from the cup cleaning nozzle is discharged to an inner peripheral surface of the outer cup through a second guide. Thus, a metallic component remaining on the outer cup is dissolved and removed from the outer cup.
Public/Granted literature
- US20180315623A1 FILM PROCESSING UNIT, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Public/Granted day:2018-11-01
Information query
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