Invention Grant
- Patent Title: Edge ring assembly for improving feature profile tilting at extreme edge of wafer
-
Application No.: US15205253Application Date: 2016-07-08
-
Publication No.: US10854492B2Publication Date: 2020-12-01
- Inventor: William Frederick Bosch , Rajesh Dorai , Tamarak Pandhumsoporn , Brett C. Richardson , James C. Vetter , Patrick Chung
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Penilla IP, APC
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01J37/32

Abstract:
An edge ring assembly is provided, including: an upper edge ring configured to surround an electrostatic chuck (ESC), the ESC having a top surface for supporting a substrate and an annular step surrounding the top surface, the annular step defining an annular shelf that is lower than the top surface, the upper edge ring being disposed above the annular shelf; a lower inner edge ring disposed below the upper edge ring in the annular step and disposed over the annular shelf, the lower inner edge ring being defined from an electrically conductive material, the lower inner edge ring being electrically insulated from the ESC; a lower outer edge ring surrounding the inner edge ring, the lower outer edge ring being disposed below the upper edge ring in the annular step and disposed over the annular shelf, the lower outer edge ring being defined from an electrically insulating material.
Public/Granted literature
- US20170053820A1 EDGE RING ASSEMBLY FOR IMPROVING FEATURE PROFILE TILTING AT EXTREME EDGE OF WAFER Public/Granted day:2017-02-23
Information query
IPC分类: