Invention Grant
- Patent Title: Circuit substrate processing laminate and method for processing circuit substrate
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Application No.: US16366637Application Date: 2019-03-27
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Publication No.: US10854496B2Publication Date: 2020-12-01
- Inventor: Shohei Tagami , Michihiro Sugo
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2018-78234 20180416
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/304 ; H01L21/67

Abstract:
A circuit substrate processing laminate has, sequentially in the order of a support, a temporary adhesive material layer releasably laminated on the support, and a circuit substrate. The circuit substrate has a front surface on which a circuit is formed and a back surface to be processed. The temporary adhesive material layer is releasably laminated to the front surface, and is composed of a thermosetting siloxane polymer layer laminated on the support, after cured, has a first peeling force of 10 to 500 mN/25 mm as measured by a 180° peel test. The first peeling force is required for peeling the polymer layer from an interface with the support. The polymer layer, after cured, has a second peeling force of 50 to 1000 mN/25 mm as measured by the 180° peel test. The second peeling force is required for peeling the polymer layer from an interface with the circuit substrate.
Public/Granted literature
- US20190318952A1 CIRCUIT SUBSTRATE PROCESSING LAMINATE AND METHOD FOR PROCESSING CIRCUIT SUBSTRATE Public/Granted day:2019-10-17
Information query
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