Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16316108Application Date: 2016-10-24
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Publication No.: US10854523B2Publication Date: 2020-12-01
- Inventor: Koichiro Nishizawa , Yoshitsugu Yamamoto , Katsumi Miyawaki , Shinsuke Watanabe , Toshihiko Shiga
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- International Application: PCT/JP2016/081393 WO 20161024
- International Announcement: WO2018/078680 WO 20180503
- Main IPC: H01L23/02
- IPC: H01L23/02 ; H01L23/04 ; H01L21/48 ; H01L23/10 ; H01L23/34 ; H01L23/552

Abstract:
A semiconductor device according to the present invention includes: a substrate; a heat generating portion provided on the substrate; a cap substrate provided above the substrate so that a hollow portion is provided between the substrate and the cap substrate; and a reflection film provided above the heat generating portion and reflecting a medium wavelength infrared ray. The reflection film reflects the infrared ray radiated to the cap substrate side through the hollow portion due to the temperature increase of the heat generating portion, so that the temperature increase of the cap substrate side can be suppressed. Because of this function, even if mold resin is provided on the cap substrate, increase of the temperature of the mold resin can be suppressed.
Public/Granted literature
- US20200185285A1 SEMICONDUCTOR DEVICE Public/Granted day:2020-06-11
Information query
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