- Patent Title: Electromigration resistant and profile consistent contact arrays
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Application No.: US16554008Application Date: 2019-08-28
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Publication No.: US10854541B2Publication Date: 2020-12-01
- Inventor: Srinivas Pietambaram , Jung Kyu Han , Ali Lehaf , Steve Cho , Thomas Heaton , Hiroki Tanaka , Kristof Darmawikarta , Robert Alan May , Sri Ranga Sai Boyapati
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L27/082
- IPC: H01L27/082 ; H01L23/498 ; H01L23/538 ; H01L25/18 ; H01L21/48 ; H01L23/00 ; H01L25/00

Abstract:
A package assembly includes a substrate and at least a first die having a first contact array and a second contact array. First and second via assemblies are respectively coupled with the first and second contact arrays. Each of the first and second via assemblies includes a base pad, a cap assembly, and a via therebetween. One or more of the cap assembly or the via includes an electromigration resistant material to isolate each of the base pad and the cap assembly. Each first cap assembly and via of the first via assemblies has a first assembly profile less than a second assembly profile of each second cap assembly and via of the second via assemblies. The first and second cap assemblies have a common applied thickness in an application configuration. The first and second cap assemblies have a thickness variation of ten microns or less in a reflowed configuration.
Public/Granted literature
- US20190393145A1 ELECTROMIGRATION RESISTANT AND PROFILE CONSISTENT CONTACT ARRAYS Public/Granted day:2019-12-26
Information query
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