- Patent Title: Semiconductor memory device and method of manufacturing the same
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Application No.: US16815096Application Date: 2020-03-11
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Publication No.: US10854633B2Publication Date: 2020-12-01
- Inventor: Takeo Mori
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/11565 ; H01L27/1157 ; H01L27/11568 ; H01L27/11521 ; H01L27/11524 ; H01L27/11556 ; H01L27/11529

Abstract:
According to an embodiment, a semiconductor memory device comprises: a stacked body that includes a plurality of control gate electrodes stacked above a substrate; a memory columnar body that extends in a first direction above the substrate and configures a memory string along with the stacked body; and a source contact that extends in the first direction and is electrically connected to one end of the memory string. Moreover, this source contact is adjacent to the stacked body via a spacer insulating layer. Furthermore, a spacer protective layer including a nitride or a metal oxide is provided between these source contact and spacer insulating layer.
Public/Granted literature
- US20200212067A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2020-07-02
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