Invention Grant
- Patent Title: One-dimensional nanostructure growth on graphene and devices thereof
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Application No.: US16195591Application Date: 2018-11-19
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Publication No.: US10854724B2Publication Date: 2020-12-01
- Inventor: Che-Wei Yang , Chi-Wen Liu , Hao-Hsiung Lin , Ling-Yen Yeh
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd. , National Taiwan University
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L29/06 ; H01L29/66 ; H01L29/775 ; H01L21/02 ; H01L29/78 ; H01L27/12 ; H01L21/20

Abstract:
A method and structure for providing a GAA device. In some embodiments, a substrate including an insulating layer disposed thereon is provided. By way of example, a first metal portion is formed within the insulating layer. In various embodiments, a first lateral surface of the first metal portion is exposed. After exposure of the first lateral surface of the first metal portion, a first graphene layer is formed on the exposed first lateral surface. In some embodiments, the first graphene layer defines a first vertical plane parallel to the exposed first lateral surface. Thereafter, in some embodiments, a first nanobar is formed on the first graphene layer, where the first nanobar extends in a first direction normal to the first vertical plane defined by the first graphene layer.
Public/Granted literature
- US20190088757A1 ONE-DIMENSIONAL NANOSTRUCTURE GROWTH ON GRAPHENE AND DEVICES THEREOF Public/Granted day:2019-03-21
Information query
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