Invention Grant
- Patent Title: Method for structuring a substrate surface
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Application No.: US16619493Application Date: 2018-06-13
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Publication No.: US10857622B2Publication Date: 2020-12-08
- Inventor: Caren Sophia Gatzen , Daniel Emil Mack , Martin Tandler , Robert Vassen
- Applicant: FORSCHUNGSZENTRUM JUELICH GmbH
- Applicant Address: DE Juelich
- Assignee: FORSCHUNGSZENTRUM JUELICH GMBH
- Current Assignee: FORSCHUNGSZENTRUM JUELICH GMBH
- Current Assignee Address: DE Juelich
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: DE102017006358 20170706
- International Application: PCT/DE2018/000184 WO 20180613
- International Announcement: WO2019/007449 WO 20190110
- Main IPC: B23K26/00
- IPC: B23K26/00 ; B23K26/03 ; B23K26/0622 ; B23K26/352 ; B23K26/08 ; B23K26/36 ; B23K26/14 ; B23K103/16

Abstract:
A method for generating a structured surface on a substrate includes analyzing a substrate surface of the substrate and selecting, as a function of a condition of the substrate surface, method parameters including focus diameter, pulse peak power, pulse energy, point spacing, pulse length, pulse spacing and/or pulse sequence. The method further includes generating, by partial ablation and partial deposition via treatment with an intensive pulsed laser beam, surface structures having dimensions in the sub-micrometer range such that a multi-scale surface structure in the sub-micrometer and micrometer range adapted to intrinsically inhomogeneous properties of the substrate surface in the sub-micrometer range is generated. The substrate is an inhomogeneous substrate.
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