Invention Grant
- Patent Title: Plasma resistant multi-layer architecture for high aspect ratio parts
-
Application No.: US16298964Application Date: 2019-03-11
-
Publication No.: US10858741B2Publication Date: 2020-12-08
- Inventor: Xiao-Ming He , Jennifer Y. Sun
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/455 ; C23C28/04 ; C25D11/24

Abstract:
Disclosed herein is an article comprising one or more channels and a multi-layer protective coating on the one or more channels. The multi-layer protective coating includes an anodization layer comprising a plurality of cracks and a plurality of pores, a sealing layer on the anodization layer, and a top layer on the sealing layer. The sealing layer comprises a metal oxide, the seals the plurality of cracks and the plurality of pores, and has a porosity of approximately 0%. The top layer comprises a rare earth oxide, a rare earth fluoride, or a rare earth oxyfluoride, has a different material composition than the sealing layer, and has a porosity of approximately 0%.
Public/Granted literature
- US20200291528A1 PLASMA RESISTANT MULTI-LAYER ARCHITECTURE FOR HIGH ASPECT RATIO PARTS Public/Granted day:2020-09-17
Information query
IPC分类: