- Patent Title: Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective
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Application No.: US15913418Application Date: 2018-03-06
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Publication No.: US10859815B2Publication Date: 2020-12-08
- Inventor: Holger Walter
- Applicant: Carl Zeiss SMT GmbH
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Agency: Fish & Richardson P.C.
- Priority: DE102015218329 20150924
- Main IPC: G02B27/00
- IPC: G02B27/00 ; G02B26/08 ; G02B26/06 ; G03F7/20 ; G02B3/04 ; G02B3/00

Abstract:
An optical correction arrangement includes a first and a second correction component arranged in succession along an optical axis. The first and the second correction components are provided with aspherical surface contours which at least approximately add up to zero overall in a zero position of the optical correction arrangement. The optical correction arrangement also includes a manipulator for displacing the first correction component in a first direction at a first speed and for displacing the second correction component in a second direction at a second speed. The first speed is greater than the second speed.
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