Invention Grant
- Patent Title: Alternating phase shift mask
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Application No.: US15843451Application Date: 2017-12-15
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Publication No.: US10859903B1Publication Date: 2020-12-08
- Inventor: Dan Yu , Aaron Michael Bowser
- Applicant: Seagate Technology LLC
- Applicant Address: US CA Fremont
- Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee Address: US CA Fremont
- Agency: Holzer Patel Drennan
- Main IPC: G03F1/30
- IPC: G03F1/30

Abstract:
An alternating phase-shifting mask (Alt-PSM) comprising a 0° phase portion having a first width and a 180° phase portion having a second width greater than the first width. Example differences between the width of the 180° phase portion and the 0° phase portion may be 10 nm, 15 nm, or 20 nm. An Alt-PSM having phase portions of different widths can have an aerial image intensity transmission graph that is symmetric, for example, at 0.2-0.3 intensity.
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