Invention Grant
- Patent Title: Superstrate and a method of using the same
-
Application No.: US16737362Application Date: 2020-01-08
-
Publication No.: US10859913B2Publication Date: 2020-12-08
- Inventor: Dwayne L. LaBrake , Niyaz Khusnatdinov
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Abel Schillinger, LLP
- Main IPC: H01L21/311
- IPC: H01L21/311 ; H01L21/3105 ; H01L21/308 ; H01L21/3065 ; G03F7/20 ; G03F7/00 ; C03C17/42

Abstract:
A body of a superstrate can be used to form an adaptive planarization layer over a substrate that has a non-uniform topography. A body of a superstrate can have bending characteristics that are well suited to achieve both conformal and planarization behavior. The body can have a surface and a thickness in a range of t1 to t2, t1=(Pd4/2Eh)1/3; t2=(5Pd4/2Eh)1/3; P is a pressure corresponding to a capillary force between the body and a planarization precursor material; d is a bending distance; E is Young's modulus for the body; and h is a step height difference between two adjacent regions of a substrate. In an embodiment, a thickness can be selected and used to determine the maximum out-of-plane displacement, wmax, for conformal behavior is sufficient and that wmax for planarization behavior is below a predetermined threshold.
Public/Granted literature
- US20200142300A1 SUPERSTRATE AND A METHOD OF USING THE SAME Public/Granted day:2020-05-07
Information query
IPC分类: