Invention Grant
- Patent Title: System and method for optical monitoring using symmetry condition of light field
-
Application No.: US16822476Application Date: 2020-03-18
-
Publication No.: US10861171B2Publication Date: 2020-12-08
- Inventor: Zeev Zalevsky , Javier Garcia
- Applicant: ContinUse Biometrics Ltd.
- Applicant Address: IL Tel Aviv
- Assignee: CONTINUSE BIOMETRICS LTD.
- Current Assignee: CONTINUSE BIOMETRICS LTD.
- Current Assignee Address: IL Tel Aviv
- Agency: Browdy and Neimark, PLLC
- Main IPC: G01H9/00
- IPC: G01H9/00 ; G06T7/246 ; H04N5/235 ; G06T5/50 ; G01B11/25

Abstract:
A system for monitoring parameters of a sample includes an imaging unit including a lens assembly and a detector unit configured for collecting light arriving from a region of interest on an object while being defocused with respect to the region of interest and generating defocused image data pieces indicative of light collected from the region of interest. The lens assembly includes at least one lens and is configured for defining at least one intermediate optical plane being a conjugate image plane or an intermediate Fourier plane with respect to an image plane of the detector unit. The system includes at least one symmetry replicator located at the at least one intermediate optical plane, thereby providing imaging of secondary speckle pattern on the detector array having a selected symmetry condition.
Public/Granted literature
- US20200302620A1 SYSTEM AND METHOD FOR OPTICAL MONITORING USING SYMMETRY CONDITION OF LIGHT FIELD Public/Granted day:2020-09-24
Information query