Invention Grant
- Patent Title: Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent
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Application No.: US15961482Application Date: 2018-04-24
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Publication No.: US10861681B2Publication Date: 2020-12-08
- Inventor: James L'Heureux , Ryan T. Downey , David Muquing Hou , Yan Rozenzon
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01J37/32
- IPC: H01J37/32 ; B01D53/32 ; H01L21/67
Abstract:
Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.
Public/Granted literature
- US20180337027A1 APPARATUS FOR COLLECTION AND SUBSEQUENT REACTION OF LIQUID AND SOLID EFFLUENT INTO GASEOUS EFFLUENT Public/Granted day:2018-11-22
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