Invention Grant
- Patent Title: Heating of a substrate for epoxy deposition
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Application No.: US16247613Application Date: 2019-01-15
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Publication No.: US10861714B2Publication Date: 2020-12-08
- Inventor: Pak Lun Cheng , Jun Qi , Yong Wang , Chao Liu , Pingliang Tu , Ka Fai Fung
- Applicant: ASM Technology Singapore Pte Ltd
- Applicant Address: SG Singapore
- Assignee: ASM TECHNOLOGY SINGAPORE PTE LTD
- Current Assignee: ASM TECHNOLOGY SINGAPORE PTE LTD
- Current Assignee Address: SG Singapore
- Agency: Ostrolenk Faber LLP
- Main IPC: H01L21/50
- IPC: H01L21/50 ; H01L21/02 ; H01L21/67 ; H01L23/00 ; H01L21/60

Abstract:
A semiconductor die is bonded using epoxy onto a substrate supported on a heating platform. After preheating the substrate with the heating platform to a temperature of between 25° C. and 60° C., an epoxy dispenser deposits an epoxy dot onto the substrate before the semiconductor die is placed onto the epoxy dot with a pick head to thereby bond the semiconductor die onto the substrate.
Public/Granted literature
- US20200227281A1 HEATING OF A SUBSTRATE FOR EPOXY DEPOSITION Public/Granted day:2020-07-16
Information query
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