Invention Grant
- Patent Title: Electrically or temperature activated shape-memory materials for warpage control
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Application No.: US16036697Application Date: 2018-07-16
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Publication No.: US10861797B2Publication Date: 2020-12-08
- Inventor: Bret K. Street
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee Address: US ID Boise
- Agency: Parsons Behle & Latimer
- Main IPC: H01L23/373
- IPC: H01L23/373 ; H01L23/00 ; H01L21/326 ; H01L21/324 ; F03G7/06

Abstract:
A semiconductor device assembly including a shape-memory element connected to at least one component of the semiconductor device assembly. The shape-memory element may be temperature activated or electrically activated. The shape-memory element is configured to move to reduce, minimize, or modify a warpage of a component of the assembly by moving to an initial shape. The shape-memory element may be applied to a surface of a component of the semiconductor device assembly or may be positioned within a component of the semiconductor device assembly such as a layer. The shape-memory element may be connected between two components of the semiconductor device assembly. A plurality of shape-memory elements may be used to reduce, minimize, and/or modify warpage of one or more components of a semiconductor device assembly.
Public/Granted literature
- US20200020646A1 Electrically or Temperature Activated Shape-Memory Materials for Warpage Control Public/Granted day:2020-01-16
Information query
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