Invention Grant
- Patent Title: Interconnect structures with intermetallic palladium joints and associated systems and methods
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Application No.: US16377558Application Date: 2019-04-08
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Publication No.: US10861825B2Publication Date: 2020-12-08
- Inventor: Jaspreet S. Gandhi
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L23/00 ; H01L25/00 ; H01L25/18

Abstract:
Interconnect structures with intermetallic palladium joints are disclosed herein. In one embodiment, an interconnect structure includes a first conductive element, a second conductive element, and an intermetallic palladium joint. The intermetallic palladium joint includes an intermetallic crystallite spanning between the first and second conductive elements. The intermetallic crystallite includes a first end portion and a second end portion. The first end portion directly contacts the first conductive element. The second end portion directly contacts the second conductive element.
Public/Granted literature
- US20190237434A1 INTERCONNECT STRUCTURES WITH INTERMETALLIC PALLADIUM JOINTS AND ASSOCIATED SYSTEMS AND METHODS Public/Granted day:2019-08-01
Information query
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