Invention Grant
- Patent Title: Semiconductor storage device
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Application No.: US16561917Application Date: 2019-09-05
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Publication No.: US10861865B2Publication Date: 2020-12-08
- Inventor: Yoshiaki Takahashi , Takahiro Tsurudo , Kiyofumi Sakurai
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2019-049019 20190315
- Main IPC: G11C16/04
- IPC: G11C16/04 ; H01L27/11573 ; H01L27/11556 ; H01L23/528 ; H01L23/522 ; H01L27/11526 ; G11C16/24 ; G11C11/56 ; H01L27/11548 ; H01L27/11575 ; H01L27/11582 ; G11C16/26

Abstract:
A semiconductor storage device includes first high-potential wirings, second high-potential wirings, a first low-potential wiring, a second low-potential wiring, a first branch wiring, and a second branch wiring formed in a wiring layer between a memory cell array and a semiconductor substrate and each extending in a first direction. The first branch wiring is electrically connected to the first low-potential wiring, and is adjacent to the first low-potential wiring on one side in a second direction perpendicular to the first direction of the first low-potential wiring. The second branch wiring is electrically connected to the second low-potential wiring, and is adjacent to the second low-potential wiring on the other side in the second direction of the second low-potential wiring. A first via is provided to contact the first branch wiring, and a second via is provided to contact the second branch wiring.
Public/Granted literature
- US20200295024A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2020-09-17
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