Invention Grant
- Patent Title: Lead material for negative electrode and method for manufacturing lead material for negative electrode
-
Application No.: US16470336Application Date: 2017-12-22
-
Publication No.: US10862096B2Publication Date: 2020-12-08
- Inventor: Yoshimitsu Oda , Keita Watanabe
- Applicant: HITACHI METALS, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI METALS, LTD.
- Current Assignee: HITACHI METALS, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2016-252314 20161227
- International Application: PCT/JP2017/046128 WO 20171222
- International Announcement: WO2018/123865 WO 20180705
- Main IPC: H01M2/26
- IPC: H01M2/26 ; H01M4/02

Abstract:
A lead material (5) for a negative electrode is made of a clad material (50) including a Cu layer (51) made of Cu or a Cu alloy and Ni layers (52, 53) each made of Ni or a Ni alloy. The Ni layers are respectively bonded to opposite surfaces of the Cu layer. The Ni layers each include a surface (52b, 53b) not bonded to the Cu layer, the surface including an oxide film (52c, 53c) with a thickness of 30 nm or less.
Public/Granted literature
- US20200185688A1 LEAD MATERIAL FOR NEGATIVE ELECTRODE AND METHOD FOR MANUFACTURING LEAD MATERIAL FOR NEGATIVE ELECTRODE Public/Granted day:2020-06-11
Information query