• Patent Title: Simultaneous multi-elements analysis type X-ray fluorescence spectrometer, and simultaneous multi-elements X-ray fluorescence analyzing method
  • Application No.: US16076112
    Application Date: 2017-02-16
  • Publication No.: US10883945B2
    Publication Date: 2021-01-05
  • Inventor: Seiji FujimuraYu Aoki
  • Applicant: RIGAKU CORPORATION
  • Applicant Address: JP Akishima
  • Assignee: RIGAKU CORPORATION
  • Current Assignee: RIGAKU CORPORATION
  • Current Assignee Address: JP Akishima
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2016-044179 20160308
  • International Application: PCT/JP2017/005678 WO 20170216
  • International Announcement: WO2017/154505 WO 20170914
  • Main IPC: G01N23/223
  • IPC: G01N23/223 G01N23/207
Simultaneous multi-elements analysis type X-ray fluorescence spectrometer, and simultaneous multi-elements X-ray fluorescence analyzing method
Abstract:
A simultaneous multi-elements analysis type X-ray fluorescence spectrometer according to the present invention includes: a sample table (2) on which a sample (1) is placed and a conveyance arm (22) for the sample (1). The sample table (2) has a cutout (2e) formed therein, through which the conveyance arm (22) is allowed to pass in a vertical direction. Regarding respective measurement points (Pn) on a blank wafer (1b), a background correction unit (21) previously stores, as background intensities at the measurement points (Pn), intensities obtained by subtracting a measured intensity at a reference measurement point (P0) located above the cutout (2e) from each of measured intensities at the measurement points (Pn), and regarding respective measurement points (Pn) on an analytical sample (1a), the background correction unit (21) subtracts the background intensities at the measurement points (Pn) from measured intensities at the measurement points (Pn), thereby correcting background.
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