Invention Grant
- Patent Title: Manufacturing method of wire grid polarizer
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Application No.: US16349639Application Date: 2017-05-17
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Publication No.: US10884170B2Publication Date: 2021-01-05
- Inventor: Dongze Li
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agent Mark M. Friedman
- Priority: CN201710229584 20170410
- International Application: PCT/CN2017/084684 WO 20170517
- International Announcement: WO2018/188150 WO 20181018
- Main IPC: C25D3/48
- IPC: C25D3/48 ; C25D3/54 ; C25D5/02 ; C25D21/12 ; G02B5/30

Abstract:
A manufacturing method of a wire grid polarizer is provided, including: setting pattern data, where the pattern data correspond to a wire grid structure of the wire grid polarizer; preparing a metal ion solution; immersing at least one surface of a carrier substrate in the metal ion solution; and emitting, by an emitter device, an electron beam to the carrier substrate, and controlling a movement of the electron beam according to the pattern data to deposit a metal on the carrier substrate at a position where the electron beam passes, to form the wire grid structure.
Public/Granted literature
- US20190331839A1 MANUFACTURING METHOD OF WIRE GRID POLARIZER Public/Granted day:2019-10-31
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