Invention Grant
- Patent Title: Chemical liquid, chemical liquid storage body, manufacturing method of chemical liquid, and manufacturing method of chemical liquid storage body
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Application No.: US16366621Application Date: 2019-03-27
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Publication No.: US10884338B2Publication Date: 2021-01-05
- Inventor: Tetsuya Kamimura
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2016-189867 20160928
- Main IPC: H01L21/02
- IPC: H01L21/02 ; G03F7/32 ; G03F7/20 ; B01D61/18 ; B01D61/20 ; B01D71/64 ; G03F7/16 ; C11D7/50 ; C11D7/04 ; G03F7/30 ; C11D7/10 ; C11D17/08 ; G03F7/004 ; G03F7/00 ; C11C3/00 ; B01D61/58 ; B01D61/36 ; B01D61/14

Abstract:
An object of the present invention is to provide a chemical liquid which has excellent defect inhibition performance and hardly breaks a transfer pipe line that a device for manufacturing the chemical liquid includes at the time of manufacturing the chemical liquid. Another object of the present invention is to provide a chemical liquid storage body, a manufacturing method of a chemical liquid, and a manufacturing method of a chemical liquid storage body. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent and an ion of at least one kind of atom selected from the group consisting of an Fe atom, a Cr atom, a Ni atom, and a Pb atom, in which in a case where the chemical liquid contains one kind of the ion, a content of the metal ion is 0.1 to 100 mass ppt, in a case where the chemical liquid contains two or more kinds of the ions, a content of each of the metal ions is 0.1 to 100 mass ppt, and a charge potential is equal to or lower than 100 mV.
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Information query
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