Invention Grant
- Patent Title: Pressure type flow rate control device, and flow rate calculating method and flow rate control method for same
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Application No.: US16327305Application Date: 2017-08-24
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Publication No.: US10884435B2Publication Date: 2021-01-05
- Inventor: Masaaki Nagase , Kaoru Hirata , Kouji Nishino , Nobukazu Ikeda
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Studebaker & Brackett PC
- Priority: JP2016-163883 20160824
- International Application: PCT/JP2017/030251 WO 20170824
- International Announcement: WO2018/038193 WO 20180301
- Main IPC: G05D7/06
- IPC: G05D7/06 ; G01F1/50 ; G05B19/416

Abstract:
A pressure-type flow rate control device 1, while maintaining an upstream pressure P1 of an orifice 5 at approximately at least twice a downstream pressure P2, calculates a flow factor FF of a mixed gas consisting of two types of gases mixed at a mixture ratio of X:(1−X) by FF=(k/ρ){2/(κ+1)}1/(κ−1)[κ/{(κ+1)R}]1/2 using an average density ρ, an average specific heat ratio κ, and an average gas constant R of the mixed gas that are calculated by weighting the densities, specific heat ratios, and gas constants of the two types of gases at the mixture ratio, and calculates a flow rate Q of the mixed gas passing through the orifice by Q=FF·S·P1(1/T1)1/2, where S is the orifice cross section, and P1 and T1 are respectively the pressure and temperature of the mixed gas on the upstream side of the orifice.
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