Invention Grant
- Patent Title: Material generation apparatus and material generation method
-
Application No.: US15622104Application Date: 2017-06-14
-
Publication No.: US10885231B2Publication Date: 2021-01-05
- Inventor: Tadayuki Matsumura , Yusuke Asari
- Applicant: Hitachi, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2016-137833 20160712
- Main IPC: G16C20/30
- IPC: G16C20/30 ; G06F30/00 ; G06N3/08

Abstract:
A genetic algorithm controller that controls respective processes using a genetic algorithm is configured. The processes include generation of a crystal structure of an inorganic material, a mutation operation of a crystal structure, a crossing-over operation of a crystal structure, structural relaxation calculation of a crystal structure, calculation of a predictive value of an objective function, selection and weeding out of a crystal structure based on a predictive value of an objective function, observation of an objective function value of a crystal structure by first-principle calculation, update of a regression model based on a result of observing the objective function value, and end determination for a material generation process.
Public/Granted literature
- US20180018408A1 MATERIAL GENERATION APPARATUS AND MATERIAL GENERATION METHOD Public/Granted day:2018-01-18
Information query