Invention Grant
- Patent Title: Spin device, and operating method therefor and manufacturing method therefor
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Application No.: US16344662Application Date: 2017-10-25
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Publication No.: US10885960B2Publication Date: 2021-01-05
- Inventor: Jin Pyo Hong , Hae Soo Park
- Applicant: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY
- Applicant Address: KR Seoul
- Assignee: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY
- Current Assignee: INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY
- Current Assignee Address: KR Seoul
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2016-0139257 20161025,KR10-2016-0139270 20161025,KR10-2016-0139304 20161025
- International Application: PCT/KR2017/011822 WO 20171025
- International Announcement: WO2018/080159 WO 20180503
- Main IPC: G11C11/16
- IPC: G11C11/16 ; G11C11/56 ; G06N3/063 ; H01L43/12 ; H01L43/08 ; H01L43/02 ; H01L27/22

Abstract:
A structure and operation method of a spin device using a magnetic domain wall movement by spin orbit torque are provided. It is possible to invert the magnetization of free layer of the device at a low value of current by using the spin orbital torque, and the structure of the device is simpler than that of the conventional CMOS. Further, a spin synapse device to which a free layer of multiaxial anisotropy is applied in addition to movement of a magnetic domain wall is provided. Since the magnetoresistance can be adjusted according to the angle of the pinned layer and the free layer, it is easy to apply multi-bit and it can be applied to artificial synapse technology.
Public/Granted literature
- US20200058339A1 SPIN DEVICE, AND OPERATING METHOD THEREFOR AND MANUFACTURING METHOD THEREFOR Public/Granted day:2020-02-20
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