Provided are a Mn—Zn—W—O sputtering target having excellent crack resistance and a production method therefor. The Mn—Zn—W—O sputtering target has a chemical composition containing Mn, Zn, W, and O. From an X-ray diffraction pattern of the Mn—Zn—W—O sputtering target, a ratio PMnO/PW of a maximum peak intensity PMnO of a peak due to a manganese oxide composed only of Mn and O to a maximum peak intensity PW of a peak due to W is 0.027 or less.