Invention Grant
- Patent Title: Wafer holding unit
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Application No.: US15739061Application Date: 2016-07-01
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Publication No.: US10886157B2Publication Date: 2021-01-05
- Inventor: Koichi Kimura , Shigenobu Sakita , Kenji Shinma , Daisuke Shimao , Katsuhiro Itakura , Masuhiro Natsuhara , Akira Mikumo
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Global IP Counselors, LLP
- Priority: JP2015-139738 20150713
- International Application: PCT/JP2016/069570 WO 20160701
- International Announcement: WO2017/010307 WO 20170119
- Main IPC: H01L21/683
- IPC: H01L21/683 ; C23C16/458 ; C23C16/509 ; H01L21/3065 ; H01L21/31 ; C23C14/50 ; H01L21/67 ; C23C16/46 ; C23C14/54 ; G03F7/20

Abstract:
A wafer holding unit includes a disk-shaped ceramic substrate having a wafer mounting surface on an upper surface of the substrate, an RF electrode, for example, embedded within the substrate, a metal terminal inserted from a lower surface of the substrate, and a connecting terminal which electrically connects the RF electrode and the metal terminal with each other. The connecting terminal is constituted by a ceramic member and a metal layer. The ceramic member is made of the same material as the substrate and preferably has a truncated conical shape. The metal layer covers a surface of the ceramic member. An upper end of the metal layer is connected to the RF electrode, while a lower end of the metal layer is connected to the metal terminal with a metal member interposed therebetween.
Public/Granted literature
- US20180174878A1 WAFER HOLDING UNIT Public/Granted day:2018-06-21
Information query
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