Invention Grant
- Patent Title: Three-dimensional semiconductor devices including vertical structures with varied spacing
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Application No.: US16563014Application Date: 2019-09-06
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Publication No.: US10886296B2Publication Date: 2021-01-05
- Inventor: Sungjoong Kim , Joon-Sung Lim , Sung-Min Hwang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2017-0098204 20170802
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/1157 ; G11C16/04 ; H01L29/423 ; H01L29/66 ; H01L27/11565

Abstract:
A three-dimensional semiconductor device is disclosed. The device may include an electrode structure that can include a plurality of electrodes that are stacked on a substrate and extend in a first direction. Vertical structures can penetrate the electrode structure to provide a plurality of columns spaced apart from each other in a second direction crossing the first direction. The plurality of columns can include first and second edge columns located adjacent to respective opposite edges of the electrode structure, and the plurality of columns can include a center column located between the first and second edge columns. Distances between adjacent ones of the plurality of columns can decrease in a direction from the first and second edge columns toward the center column.
Public/Granted literature
- US20190393243A1 THREE-DIMENSIONAL SEMICONDUCTOR DEVICES INCLUDING VERTICAL STRUCTURES WITH VARIED SPACING Public/Granted day:2019-12-26
Information query
IPC分类: