- Patent Title: Photoelectric sensor, fabricating method thereof and display device
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Application No.: US16327892Application Date: 2018-05-17
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Publication No.: US10886310B2Publication Date: 2021-01-05
- Inventor: Yuzhen Guo , Xue Dong , Haisheng Wang , Chunwei Wu , Yingming Liu , Rui Xu
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Brooks Kushman P.C.
- Priority: CN201710383647 20170526
- International Application: PCT/CN2018/087253 WO 20180517
- International Announcement: WO2018/214799 WO 20181129
- Main IPC: H01L27/146
- IPC: H01L27/146 ; G06F21/32

Abstract:
The application discloses a photoelectric sensor, a fabricating method thereof, and a display device. The method for fabricating the photoelectric sensor, includes: fabricating a thin film transistor (TFT) array and a photodiode array on a silicon substrate; transferring the TFT array onto a base substrate by a micro transfer process; and placing the photodiode array on the base substrate formed with the TFT array, in a manner that an orthographic projection of the photodiode array on the base substrate overlaps with an orthographic projection of the TFT array on the base substrate.
Public/Granted literature
- US20190198543A1 PHOTOELECTRIC SENSOR, FABRICATING METHOD THEREOF AND DISPLAY DEVICE Public/Granted day:2019-06-27
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