Invention Grant
- Patent Title: Grouped nanostructured units system forming a metamaterial
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Application No.: US14890606Application Date: 2014-05-13
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Publication No.: US10886422B2Publication Date: 2021-01-05
- Inventor: Zbigniew Kuznicki , Patrick Meyrueis
- Applicant: SEGTON ADVANCED TECHNOLOGY
- Applicant Address: FR Versailles
- Assignee: SEGTON ADVANCED TECHNOLOGY
- Current Assignee: SEGTON ADVANCED TECHNOLOGY
- Current Assignee Address: FR Versailles
- Agency: Seckel IP, PLLC
- International Application: PCT/IB2014/002019 WO 20140513
- International Announcement: WO2014/203081 WO 20141224
- Main IPC: H01L31/0352
- IPC: H01L31/0352 ; H01L31/068 ; H01L31/18 ; H01L31/20 ; H01L31/036 ; H01L31/0288 ; G02B1/00 ; H01L31/0216 ; H01L31/0376

Abstract:
This invention concerns a grouped nanostructured unit system forming a metamaterial within the silicon and the manufacturing process to arrange them therein in an optimal manner. The nanostructured units are grouped and conditioned in an optimal arrangement inside the silicon material. The process comprises the modification of the elementary crystal unit together with the stress field, the electric field and a heavy impurity doping in order to form a superlattice of nanostructured units grouped in an optimal arrangement so as to improve the efficiency of the light-to-electricity conversion by means of efficient use of the kinetic energy of hot electrons and efficient collection of all electrons generated within the converter.
Public/Granted literature
- US20160118517A1 GROUPED NANOSTRUCTURED UNITS SYSTEM FORMING A METAMATERIAL Public/Granted day:2016-04-28
Information query
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