Invention Grant
- Patent Title: DC-capable cryogenic microwave filter with reduced Kapitza resistance
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Application No.: US16136956Application Date: 2018-09-20
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Publication No.: US10886585B2Publication Date: 2021-01-05
- Inventor: Patryk Gumann , Salvatore Bernardo Olivadese
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Amin, Turocy & Watson, LLP
- Main IPC: H01P1/203
- IPC: H01P1/203 ; H01P1/30 ; H01B12/02 ; H01P1/205 ; H05K7/20

Abstract:
An architecture for, and techniques for fabricating, a cryogenic microwave filter having reduced Kapitza resistance are provided. In some embodiments, the cryogenic microwave filter can comprise a substrate and a conductive line. The substrate can be formed of a material having a thermal conductivity property that sufficiently reduces Kapitza resistance in the cryogenic environment. The conductive line can be formed in a recess of the substrate and facilitate a filter operation on a microwave signal propagated in a cryogenic environment. In some embodiments, the conductive line can be formed according to a sintering technique that can reduce Kapitza resistance.
Public/Granted literature
- US20200099116A1 DC-CAPABLE CRYOGENIC MICROWAVE FILTER WITH REDUCED KAPITZA RESISTANCE Public/Granted day:2020-03-26
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