Invention Grant
- Patent Title: Scattered void reservoir
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Application No.: US16430311Application Date: 2019-06-03
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Publication No.: US10886605B2Publication Date: 2021-01-05
- Inventor: Cagdas Varel , Steven Howard Linn , Felix Chen
- Applicant: Kymeta Corporation
- Applicant Address: US WA Redmond
- Assignee: Kymeta Corporation
- Current Assignee: Kymeta Corporation
- Current Assignee Address: US WA Redmond
- Agency: Womble Bond Dickinson (US) LLP
- Main IPC: H01Q1/36
- IPC: H01Q1/36 ; H03L7/099 ; H01Q15/00

Abstract:
An antenna apparatus and method for using the same are disclosed. In one embodiment, the antenna comprises an antenna element array having a plurality of radiating radio-frequency (RF) antenna elements formed using portions of first and second substrates with a liquid crystal (LC) therebetween, the first substrate comprising a plurality of irises and the second substrate comprises a plurality of patches, wherein each of the patches is co-located over and separated from an iris in the plurality of irises with LC at least partially between each overlap region a patch and iris overlap; and a reservoir structure between the first and second substrates to hold LC and comprising areas around the RF antenna elements, the reservoir structure having a cavity large enough to accommodate thermal expansion of the LC and having one or more areas void of LC, wherein LC remains in patch/iris overlap regions of the plurality of radiating RF antenna elements even when additional LC could enter the one or more areas void of LC.
Information query