Invention Grant
- Patent Title: High brightness laser-produced plasma light source
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Application No.: US16773240Application Date: 2020-01-27
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Publication No.: US10887973B2Publication Date: 2021-01-05
- Inventor: Vladimir Vitalievich Ivanov , Aleksandr Yurievich Vinokhodov , Konstantin Nikolaevich Koshelev , Mikhail Sergeyevich Krivokorytov , Vladimir Mikhailovich Krivtsun , Aleksandr Andreevich Lash , Vyacheslav Valerievich Medvedev , Yury Viktorovich Sidelnikov , Oleg Feliksovich Yakushev , Oleg Borisovich Khristoforov , Denis Aleksandrovich Glushkov , Samir Ellwi
- Applicant: Isteq B.V. , RnD-ISAN, Ltd
- Applicant Address: NL Eindhoven; RU Moscow
- Assignee: Isteq B.V.,RnD-ISAN, Ltd
- Current Assignee: Isteq B.V.,RnD-ISAN, Ltd
- Current Assignee Address: NL Eindhoven; RU Moscow
- Agent Nadya Reingand; Yan Hankin
- Priority: RU2019113052 20190426,RU2020103063 20200125
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/00 ; G03F7/20

Abstract:
Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45° to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.
Public/Granted literature
- US20200163197A1 HIGH BRIGHTNESS LASER-PRODUCED PLASMA LIGHT SOURCE Public/Granted day:2020-05-21
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