Invention Grant
- Patent Title: Gas doping systems for controlled doping of a melt of semiconductor or solar-grade material
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Application No.: US16228235Application Date: 2018-12-20
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Publication No.: US10889913B2Publication Date: 2021-01-12
- Inventor: Stephan Haringer , Roberto Scala , Marco D'Angella
- Applicant: MEMC Electronic Materials S.p.A.
- Applicant Address: IT Novara
- Assignee: MEMC Electronic Materials S.p.A.
- Current Assignee: MEMC Electronic Materials S.p.A.
- Current Assignee Address: IT Novara
- Agency: Armstrong Teasdale LLP
- Main IPC: C30B15/04
- IPC: C30B15/04 ; C30B29/06 ; C30B15/10

Abstract:
A crystal pulling apparatus for producing an ingot is provided. The apparatus includes a furnace and a gas doping system. The furnace includes a crucible for holding a melt. The gas doping system includes a feeding tube, an evaporation receptacle, and a fluid flow restrictor. The feeding tube is positioned within the furnace, and includes at least one feeding tube sidewall, a first end through which a solid dopant is introduced into the feeding tube, and an opening opposite the first end through which a gaseous dopant is introduced into the furnace. The evaporation receptacle is configured to vaporize the dopant therein, and is disposed near the opening of the feeding tube. The fluid flow restrictor is configured to permit the passage of solid dopant therethrough and restrict the flow of gaseous dopant therethrough, and is disposed within the feeding tube between the first end and the evaporation receptacle.
Public/Granted literature
- US20190119827A1 GAS DOPING SYSTEMS FOR CONTROLLED DOPING OF A MELT OF SEMICONDUCTOR OR SOLAR-GRADE MATERIAL Public/Granted day:2019-04-25
Information query
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